发明授权
- 专利标题： Extreme UV and soft X ray generator
- 专利标题（中）： 极端的UV和软X射线发生器
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申请号： US10567038申请日： 2004-07-29
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公开(公告)号： US07734014B2公开(公告)日： 2010-06-08
- 发明人: Klaus Bergmann , Willi Neff
- 申请人： Klaus Bergmann , Willi Neff
- 申请人地址： NL Eindhoven
- 专利权人： Koninklijke Philips Electronics N.V.
- 当前专利权人： Koninklijke Philips Electronics N.V.
- 当前专利权人地址： NL Eindhoven
- 优先权： DE10336273 20030807
- 国际申请： PCT/IB2004/051323 WO 20040729
- 国际公布： WO2005/015602 WO 20050217
- 主分类号： H01J35/06
- IPC分类号： H01J35/06 ; H01J35/02 ; G21G4/00
摘要：
A gas discharge source, in particular, for generating extreme ultraviolet and/or soft X-radiation, has a gas-filled intermediate electrode space located between two electrodes, devices for the admission and evacuation of gas, and one electrode that has an opening that defines an axis of symmetry and is provided for the discharge of radiation. A diaphragm exhibits at least one opening on the axis of symmetry and operates as a differential pump stage, between the two electrodes.
公开/授权文献
- US20080143228A1 Extreme Uv and Soft X Ray Generator 公开/授权日：2008-06-19
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