发明授权
- 专利标题: Electromechanical device treatment with water vapor
- 专利标题(中): 机电装置用水蒸气处理
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申请号: US12163660申请日: 2008-06-27
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公开(公告)号: US07738158B2公开(公告)日: 2010-06-15
- 发明人: Bangalore R. Natarajan , Kasra Khazeni , David Heald , Rihui He , Sriram Akella , Evgeni Gousev
- 申请人: Bangalore R. Natarajan , Kasra Khazeni , David Heald , Rihui He , Sriram Akella , Evgeni Gousev
- 申请人地址: US CA San Diego
- 专利权人: QUALCOMM MEMS Technologies, Inc.
- 当前专利权人: QUALCOMM MEMS Technologies, Inc.
- 当前专利权人地址: US CA San Diego
- 代理机构: Knobbe, Martens, Olson & Bear, LLP
- 主分类号: G02B26/00
- IPC分类号: G02B26/00 ; G02F1/03
摘要:
Methods, devices, and systems provide MEMS devices exhibiting at least one of reduced stiction, reduced hydrophilicity, or reduced variability of certain electrical characteristics using MEMS devices treated with water vapor. The treatment is believed to form one or more passivated surfaces on the interior and/or exterior of the MEMS devices. Relatively gentle temperature and pressure conditions ensure modification of surface chemistry without excessive water absorption after removal of sacrificial material to release the MEMS devices.
公开/授权文献
- US20090002804A1 ELECTROMECHANICAL DEVICE TREATMENT WITH WATER VAPOR 公开/授权日:2009-01-01