Abstract:
This disclosure provides systems, methods and apparatus for encapsulating electromechanical systems devices. In one aspect, large arrays of electromechanical systems devices can be encapsulated. In one aspect the encapsulation includes an encapsulation layer supported over the electromechanical systems devices by encapsulation layer supports. The encapsulation layer can also include a plurality of orifices. The orifices can be sealed such that the electromechanical systems devices below are not damaged.
Abstract:
This disclosure provides systems, methods and apparatus for fabricating spacers for electromechanical systems devices. In one aspect, a method of forming a spacer on a spacer portion of a device surface of an electromechanical systems device includes exposing the device surface to spacer particles suspended in a fluid. The spacer particles are allowed to attach to the spacer portion. Each of the spacer particles can have at least one dimension of about 1 micron to 10 microns. The electromechanical systems device can also include a sacrificial layer that is subsequently removed between the device surface and a substrate surface of a substrate on which the electromechanical systems device is formed.
Abstract:
This disclosure provides systems, methods and apparatus for EMS devices. In one aspect, an EMS device includes an array of display elements and a plurality of driver lines with at least a portion of the plurality of driver lines routed above or below the array between one or more driver circuits and the array. In some implementations, at least a portion of the plurality of driver lines is disposed above a non-active area of the array. In one aspect, an EMS device can form a portion of at least one of the plurality of driver lines. In some implementations, movable layers of the array can be disposed between at least a portion of the plurality of driver lines and stationary electrodes of the display.
Abstract:
This disclosure provides systems, methods and apparatus for EMS devices. In one aspect, an EMS device includes an array of display elements and a plurality of driver lines with at least a portion of the plurality of driver lines routed above or below the array between one or more driver circuits and the array. In some implementations, at least a portion of the plurality of driver lines is disposed above a non-active area of the array. In one aspect, an EMS device can form a portion of at least one of the plurality of driver lines. In some implementations, movable layers of the array can be disposed between at least a portion of the plurality of driver lines and stationary electrodes of the display.
Abstract:
A MEMS device may be package with a desiccant to provide a moisture-free environment. In order to avoid undesirable effects on the MEMS device, the desiccant may be selected or treated so as to be compatible with a particular MEMS device. This treatment may include baking of the desiccant to as to cause outgassing of moisture or other undesirable material. The structure of the MEMS device may also be altered to improve compatibility with particular desiccants.
Abstract:
Methods, devices, and systems provide MEMS devices exhibiting at least one of reduced stiction, reduced hydrophilicity, or reduced variability of certain electrical characteristics using MEMS devices treated with water vapor. The treatment is believed to form one or more passivated surfaces on the interior and/or exterior of the MEMS devices. Relatively gentle temperature and pressure conditions ensure modification of surface chemistry without excessive water absorption after removal of sacrificial material to release the MEMS devices.
Abstract:
This disclosure provides systems, methods and apparatus for encapsulating a display device. In one aspect, an interferometric modulator (IMOD) is formed on a substrate. The IMOD includes an absorbing layer separated from the substrate, a reflective layer between the absorbing layer and the substrate, and an optical gap between the absorbing layer and the reflective layer. One or more thin film encapsulation layers hermetically seal the IMOD between the one or more thin film encapsulation layers and the substrate. In another aspect, an optical or functional layer can be formed over the one or more thin film encapsulation layers.
Abstract:
This disclosure provides systems, methods and apparatus for storage capacitors. In one aspect, a device includes an array having at least a first display element and a second display element, at least one switch configured to control a flow of charge between a source and the first display element, and at least one interferometric optical mask structure disposed in a non-active area of the array between the first display element and the second display element. The optical mask structure includes a storage capacitor formed by a first conductive layer and a second conductive layer. The storage capacitor is electrically coupled to the at least one switch and the first display element.
Abstract:
Methods, devices, and systems provide MEMS devices exhibiting at least one of reduced stiction, reduced hydrophilicity, or reduced variability of certain electrical characteristics using MEMS devices treated with water vapor. The treatment is believed to form one or more passivated surfaces on the interior and/or exterior of the MEMS devices. Relatively gentle temperature and pressure conditions ensure modification of surface chemistry without excessive water absorption after removal of sacrificial material to release the MEMS devices.
Abstract:
A method of forming free standing microstructures includes providing a substrate and forming a sacrificial layer on the substrate. A thin-film structural layer is then formed around and over the sacrificial layer. The sacrificial layer may be formed from an electrically conductive or non-electrically conductive material in certain embodiments of the invention. Nanometer-scale pores are then introduced through the thin-film structural layer by a non-lithographic method, such as anodic etching. Via the pores, at least a portion of the sacrificial layer is etched away or otherwise removed from underneath the thin-film structural layer. The free standing microstructures may be sealed by application of a sealing layer on top thereof. The microstructure may form an encapsulating cavity and provide integrated on-wafer packaging if separate microdevices are disposed inside the cavity. The entire process may be done at or near room temperature in some cases.