发明授权
- 专利标题: Semiconductor laser and method for fabricating the same
- 专利标题(中): 半导体激光器及其制造方法
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申请号: US12065991申请日: 2007-07-09
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公开(公告)号: US07738525B2公开(公告)日: 2010-06-15
- 发明人: Daisuke Ueda , Masaaki Yuri , Yoshiaki Hasegawa , Kenichi Matsuda
- 申请人: Daisuke Ueda , Masaaki Yuri , Yoshiaki Hasegawa , Kenichi Matsuda
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2006-208938 20060731
- 国际申请: PCT/JP2007/063681 WO 20070709
- 国际公布: WO2008/015882 WO 20080207
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
A semiconductor laser (101) includes a first cladding layer (103), an active layer (105) and a second cladding layer (108). A window region (115) including fluorine, that is, an impurity element with higher electronegativity than nitrogen, is formed in the vicinity of a front end face (113) and a rear end face (114) of a laser resonator. The window region (115) is formed by exposing the front end face (113) and the rear end face (114) to carbon fluoride (CF4) plasma. The effective band gap of a portion of the active layer (105) disposed in the window region (115) is larger than the effective band gap of another portion of the active layer, and hence, it functions as an end face window structure for suppressing COD.
公开/授权文献
- US20090135875A1 SEMICONDUCTOR LASER AND METHOD FOR FABRICATING THE SAME 公开/授权日:2009-05-28
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