发明授权
- 专利标题： Method and apparatus for manufacturing patterned media
- 专利标题（中）： 用于制造图案化介质的方法和装置
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申请号： US11472525申请日： 2006-06-22
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公开(公告)号： US07740767B2公开(公告)日： 2010-06-22
- 发明人: Akira Kikitsu , Yoshiyuki Kamata , Satoshi Shirotori , Masatoshi Sakurai
- 申请人： Akira Kikitsu , Yoshiyuki Kamata , Satoshi Shirotori , Masatoshi Sakurai
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 优先权： JP2005-185234 20050624
- 主分类号： B44C1/22
- IPC分类号： B44C1/22 ; B05D5/12 ; B05D1/32 ; B05D1/02 ; H01L21/306
摘要：
According to one embodiment, a method for manufacturing a patterned media includes forming patterns of a magnetic layer having protrusions and recesses corresponding to tracks, servo zones or data zones on a substrate having a center hole, and spraying gas flow produced by diffusing a liquid gas toward the center hole of the substrate before or after forming the patterns of the magnetic layer.
公开/授权文献
- US20060289382A1 Method and apparatus for manufacturing patterned media 公开/授权日：2006-12-28
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