发明授权
US07745821B2 Aryl dicarboxylic acid diimidazole-based compounds as n-type semiconductor materials for thin film transistors
失效
作为用于薄膜晶体管的n型半导体材料的芳基二羧酸二咪唑类化合物
- 专利标题: Aryl dicarboxylic acid diimidazole-based compounds as n-type semiconductor materials for thin film transistors
- 专利标题(中): 作为用于薄膜晶体管的n型半导体材料的芳基二羧酸二咪唑类化合物
-
申请号: US11748622申请日: 2007-05-15
-
公开(公告)号: US07745821B2公开(公告)日: 2010-06-29
- 发明人: Shiying Zheng , Deepak Shukla , Diane C. Freeman
- 申请人: Shiying Zheng , Deepak Shukla , Diane C. Freeman
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 代理商 Chris P. Konkol; J. Lanny Tucker
- 主分类号: H01L35/24
- IPC分类号: H01L35/24 ; H01L51/00
摘要:
A thin film transistor comprises a layer of organic semiconductor material comprising an organic semiconductor material that comprises an aryl dicarboxylic acid diimidazole-based compound. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating ac thin film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 150° C.
公开/授权文献
信息查询
IPC分类: