发明授权
US07760325B2 Exposure system and method for manufacturing device 失效
曝光系统及其制造方法

Exposure system and method for manufacturing device
摘要:
An exposure system includes an exposure apparatus and a fluid supplying apparatus that supplies fluid to the exposure apparatus via flow channels. The fluid supplying apparatus includes a fluid sending unit, a heat exchanger, a first temperature sensor that measures the temperature of the fluid, a filter that removes unwanted substances in the fluid, and a heater disposed downstream of the filter in the fluid supplying apparatus for adjusting the temperature of the fluid. The exposure apparatus includes a second temperature sensor that measures the temperature of the fluid supplied from the fluid supplying apparatus. The heater adjusts the temperature of the fluid on the basis of the information on the temperature measured by the second temperature sensor.
公开/授权文献
信息查询
0/0