发明授权
- 专利标题: Exposure system and method for manufacturing device
- 专利标题(中): 曝光系统及其制造方法
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申请号: US12118254申请日: 2008-05-09
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公开(公告)号: US07760325B2公开(公告)日: 2010-07-20
- 发明人: Yoshiyuki Okada
- 申请人: Yoshiyuki Okada
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Canon U.S.A., Inc. I.P. Division
- 优先权: JP2007-146347 20070531
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42
摘要:
An exposure system includes an exposure apparatus and a fluid supplying apparatus that supplies fluid to the exposure apparatus via flow channels. The fluid supplying apparatus includes a fluid sending unit, a heat exchanger, a first temperature sensor that measures the temperature of the fluid, a filter that removes unwanted substances in the fluid, and a heater disposed downstream of the filter in the fluid supplying apparatus for adjusting the temperature of the fluid. The exposure apparatus includes a second temperature sensor that measures the temperature of the fluid supplied from the fluid supplying apparatus. The heater adjusts the temperature of the fluid on the basis of the information on the temperature measured by the second temperature sensor.
公开/授权文献
- US20090011376A1 EXPOSURE SYSTEM AND METHOD FOR MANUFACTURING DEVICE 公开/授权日:2009-01-08
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