发明授权
- 专利标题： Photosensitive resin composition
- 专利标题（中）： 感光树脂组合物
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申请号： US11844886申请日： 2007-08-24
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公开(公告)号： US07763402B2公开(公告)日： 2010-07-27
- 发明人: Hyun-il Cho , Taeg-sung Jung , Hee-jung Jung , Chan-seok Park
- 申请人： Hyun-il Cho , Taeg-sung Jung , Hee-jung Jung , Chan-seok Park
- 申请人地址： KR
- 专利权人： Dongjin Semichem Co., Ltd.
- 当前专利权人： Dongjin Semichem Co., Ltd.
- 当前专利权人地址： KR
- 代理机构： Cantor Colburn LLP
- 优先权： KR10-2006-0081016 20060825
- 主分类号： G02B5/20
- IPC分类号： G02B5/20 ; G03C1/00
摘要：
The present invention relates to a photosensitive resin composition, and more particularly, to a photosensitive resin composition for forming an over coating layer of a color filter. The photosensitive resin composition according to the present invention includes a UV absorber. The photosensitive resin composition according to the present invention adjusts line width and height of a pattern without difficulty, forms a linear pattern, provides good transmittance and is adequate to form the over coating layer of the color filter.
公开/授权文献
- US20080051483A1 PHOTOSENSITIVE RESIN COMPOSITION 公开/授权日：2008-02-28
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