发明授权
US07763954B2 Post last wiring level inductor using patterned plate process 失效
使用图案板工艺后最后布线级电感器

Post last wiring level inductor using patterned plate process
摘要:
A semiconductor structure. The semiconductor structure includes: a substrate having at least one metal wiring level within the substrate; an insulative layer on a surface of the substrate; an inductor within the insulative layer; and a wire bond pad within the insulative layer. The inductor and the wire bond pad are substantially co-planar. The inductor has a height greater than a height of the wire bond pad.
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