发明授权
US07764468B2 Method for removing smear and magnetic recording/reproducing apparatus with function of removing smear
失效
清除涂片和磁记录/再现装置的方法,具有去除涂片的功能
- 专利标题: Method for removing smear and magnetic recording/reproducing apparatus with function of removing smear
- 专利标题(中): 清除涂片和磁记录/再现装置的方法,具有去除涂片的功能
-
申请号: US11735624申请日: 2007-04-16
-
公开(公告)号: US07764468B2公开(公告)日: 2010-07-27
- 发明人: Yoshikazu Sawada , Norio Takahashi , Masaru Hirose , Mitsuo Otsuki , Shoji Toyoda , Anthony Wai Yuen Lai
- 申请人: Yoshikazu Sawada , Norio Takahashi , Masaru Hirose , Mitsuo Otsuki , Shoji Toyoda , Anthony Wai Yuen Lai
- 申请人地址: JP Tokyo CN N.T. Hong Kong
- 专利权人: TDK Corporation,SAE Magnetics (H.K.) Ltd.
- 当前专利权人: TDK Corporation,SAE Magnetics (H.K.) Ltd.
- 当前专利权人地址: JP Tokyo CN N.T. Hong Kong
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: G11B5/33
- IPC分类号: G11B5/33 ; G11B5/03
摘要:
Provided is a smear-removing method that can remove smear of a manufactured thin-film magnetic head. The method is performed to a thin-film magnetic head including an MR effect element for reading data having two electrode layers sandwiching an MR effect multilayer as a magneto-sensitive portion therebetween. The method comprises the step of applying a stress voltage less than a breaking voltage of the MR effect element between the two electrode layers to burn off smear. In the method, it is preferable that the stress voltage is applied while an electric resistance or an output voltage of the MR effect element is measured, and the stress voltage is increased until the value of the electric resistance or the output voltage reaches an upper limit specified value specified from a value of an electric resistance or an output voltage in a normal case where smear is not present.
公开/授权文献
信息查询
IPC分类: