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US07768071B2 Stabilizing breakdown voltages by forming tunnels for ultra-high voltage devices 有权
通过形成超高压设备的隧道来稳定击穿电压

Stabilizing breakdown voltages by forming tunnels for ultra-high voltage devices
Abstract:
A semiconductor structure includes a semiconductor substrate of a first conductivity type; a pre-high-voltage well (pre-HVW) in the semiconductor substrate, wherein the pre-HVW is of a second conductivity type opposite the first conductivity type; a high-voltage well (HVW) over the pre-HVW, wherein the HVW is of the second conductivity type; a field ring of the first conductivity type occupying a top portion of the HVW; and a tunnel of the first conductivity type in the pre-HVW and the HVW, and electrically connecting the field ring and the semiconductor substrate.
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