Invention Grant
US07768087B2 Photodiode, solid slate image sensor, and method of manufacturing the same
有权
光电二极管,固体石板图像传感器及其制造方法
- Patent Title: Photodiode, solid slate image sensor, and method of manufacturing the same
- Patent Title (中): 光电二极管,固体石板图像传感器及其制造方法
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Application No.: US12037438Application Date: 2008-02-26
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Publication No.: US07768087B2Publication Date: 2010-08-03
- Inventor: Masaya Katayama
- Applicant: Masaya Katayama
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Semiconductor Limited
- Current Assignee: Fujitsu Semiconductor Limited
- Current Assignee Address: JP Yokohama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Main IPC: H01L31/0216
- IPC: H01L31/0216

Abstract:
A photodiode formed over a silicon substrate is disclosed. The photodiode includes a light-receiving region formed of a diffusion region of a first conduction type at the surface of the silicon substrate and forming a pn junction; an intermediate region formed of a diffusion region of the first conduction type at the surface of the silicon substrate so as to be included in the light-receiving region; a contact region formed of a diffusion region of the first conduction type at the surface of the silicon substrate so as to be included in the intermediate region; a shield layer formed of a diffusion region of a second conduction type in a part of the surface of the silicon substrate outside the intermediate region; and an electrode in contact with the contact region. The shield layer faces the side end part of the diffusion region forming the intermediate region.
Public/Granted literature
- US20090001496A1 PHOTODIODE, SOLID STATE IMAGE SENSOR, AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-01-01
Information query
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