发明授权
- 专利标题： Process for polishing glass substrate
- 专利标题（中）： 抛光玻璃基板的工艺
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申请号： US11779441申请日： 2007-07-18
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公开(公告)号： US07771603B2公开(公告)日： 2010-08-10
- 发明人: Koji Otsuka , Masabumi Ito , Hiroshi Kojima
- 申请人： Koji Otsuka , Masabumi Ito , Hiroshi Kojima
- 申请人地址： JP Tokyo
- 专利权人： Asahi Glass Company, Limited
- 当前专利权人： Asahi Glass Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2005-026365 20050202
- 主分类号： C03C15/00
- IPC分类号： C03C15/00
摘要：
A process for polishing a glass substrate, which enables to polish a glass substrate having a large waviness formed by mechanical polishing, to have a surface excellent in flatness, is provided.A process for polishing a glass substrate, comprising a step of measuring the surface profile of a mechanically polished glass substrate to identify the width of waviness present in the glass substrate, and a step of applying dry etching using a beam having a beam size in FWHM (full width of half maximum) value of at most the above size of waviness, to polish the surface of the glass substrate.
公开/授权文献
- US20070259605A1 PROCESS FOR POLISHING GLASS SUBSTRATE 公开/授权日：2007-11-08
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