发明授权
US07778805B2 Regression system and methods for optical proximity correction modeling
有权
用于光学邻近校正建模的回归系统和方法
- 专利标题： Regression system and methods for optical proximity correction modeling
- 专利标题（中）： 用于光学邻近校正建模的回归系统和方法
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申请号： US11191849申请日： 2005-07-28
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公开(公告)号： US07778805B2公开(公告)日： 2010-08-17
- 发明人: Wen Chun Huang , Ru-Gun Liu , Chih-Ming Lai , Chen Kun Tsai , Chien Wen Lai , Cherng-Shyan Tsay , Cheng Cheng Kuo , Yao-Ching Ku
- 申请人： Wen Chun Huang , Ru-Gun Liu , Chih-Ming Lai , Chen Kun Tsai , Chien Wen Lai , Cherng-Shyan Tsay , Cheng Cheng Kuo , Yao-Ching Ku
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Haynes and Boone, LLP
- 主分类号： G06F7/60
- IPC分类号： G06F7/60 ; G06F17/10
摘要：
An optimized optical proximity correction modeling method comprises receiving a selection of a regression method, displaying regression parameters, receiving values for the displayed regression parameters, receiving a selection of an optimization method, displaying optimization parameters, receiving values for the displayed optimization parameters, and generating an optimized optical proximity correction output.