发明授权
US07781060B2 Hollow silica nanoparticles as well as synthesis processes and applications thereof
失效
中空二氧化硅纳米颗粒以及其合成方法和应用
- 专利标题: Hollow silica nanoparticles as well as synthesis processes and applications thereof
- 专利标题(中): 中空二氧化硅纳米颗粒以及其合成方法和应用
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申请号: US12002916申请日: 2007-12-18
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公开(公告)号: US07781060B2公开(公告)日: 2010-08-24
- 发明人: Weidong Li , Shivkumar Chiruvolu , Hui Du , Igor Altman , Ronald J. Mosso , Nobuyuki Kambe
- 申请人: Weidong Li , Shivkumar Chiruvolu , Hui Du , Igor Altman , Ronald J. Mosso , Nobuyuki Kambe
- 申请人地址: US CA Milpitas
- 专利权人: NanoGram Corporation
- 当前专利权人: NanoGram Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Dardi & Herbert, PLLC
- 代理商 Peter S. Dardi
- 主分类号: B32B5/16
- IPC分类号: B32B5/16
摘要:
Hollow silica nanoparticles can have well defined non-porous shells with low shell fragmentation and good dispersability. These well defined hollow particles can be formed through the controlled oxidation of silicon nanoparticles in an organic solvent. The hollow nanoparticles can have a submicron secondary particle sizes. The hollow silica nanoparticles can be incorporated into polymer composites, such as low index-of-refraction composites, for appropriate applications.
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