发明授权
- 专利标题: Hydrogen iodide manufacturing method and hydrogen iodide manufacturing apparatus
- 专利标题(中): 碘化氢制造方法和碘化氢制造装置
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申请号: US12212894申请日: 2008-09-18
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公开(公告)号: US07785542B2公开(公告)日: 2010-08-31
- 发明人: Ryouta Takahashi , Hideki Nakamura , Kazuo Murakami , Haruhiko Takase , Noboru Jimbo , Kazuya Yamada
- 申请人: Ryouta Takahashi , Hideki Nakamura , Kazuo Murakami , Haruhiko Takase , Noboru Jimbo , Kazuya Yamada
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2005-213111 20050722
- 主分类号: B01J10/00
- IPC分类号: B01J10/00 ; G05D16/00 ; C01B7/13 ; C01B17/74 ; C01B3/02
摘要:
A hydrogen iodide manufacturing method which includes a step of producing aqueous solution of hydrogen iodide and sulfuric acid by causing iodine-containing aqueous solution and sulfur dioxide to react with each other in a pressurized condition. The pressurized condition may be of not lower than 0.1 MPa in gauge pressure. The method may further include: a separation step of adding iodine to the aqueous solution of hydrogen iodide and separating an upper phase containing sulfuric acid relatively to a large extent and a lower phase containing hydrogen iodide relatively to a large extent; and a step of producing hydrogen iodide by adding sulfur dioxide to the upper phase in a pressurized condition and extracting the produced hydrogen iodide to the lower phase.
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