发明授权
US07785959B2 Method of multi-port memory fabrication with parallel connected trench capacitors in a cell
失效
在单元中并联连接沟槽电容器的多端口存储器制造方法
- 专利标题: Method of multi-port memory fabrication with parallel connected trench capacitors in a cell
- 专利标题(中): 在单元中并联连接沟槽电容器的多端口存储器制造方法
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申请号: US12316748申请日: 2008-12-16
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公开(公告)号: US07785959B2公开(公告)日: 2010-08-31
- 发明人: Kangguo Cheng , Ramachandra Divakaruni , Jack A. Mandelman , Carl J. Radens , Geng Wang
- 申请人: Kangguo Cheng , Ramachandra Divakaruni , Jack A. Mandelman , Carl J. Radens , Geng Wang
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 H. Daniel Schnurmann
- 主分类号: H01L21/8242
- IPC分类号: H01L21/8242
摘要:
A method is provided for fabricating a multi-port memory in which a plurality of parallel connected capacitors are in a cell. A plurality of trench capacitors are formed which have capacitor dielectric layers extending along walls of the plurality of trenches, the plurality of trench capacitors having first capacitor plates and second capacitor plates opposite the capacitor dielectric layers from the first capacitor plates. The first capacitor plates are conductively tied together and the second capacitor plates are conductively tied together. In this way, the first capacitor plates are adapted to receive a same variable voltage and the second capacitor plates are adapted to receive a same fixed voltage.
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