发明授权
- 专利标题: Semiconductor device and method of manufacturing same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US10421238申请日: 2003-04-23
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公开(公告)号: US07786496B2公开(公告)日: 2010-08-31
- 发明人: Shunpei Yamazaki , Satoshi Seo , Hideaki Kuwabara
- 申请人: Shunpei Yamazaki , Satoshi Seo , Hideaki Kuwabara
- 申请人地址: JP
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Cook Alex Ltd.
- 优先权: JP2002-123188 20020424
- 主分类号: H01L35/24
- IPC分类号: H01L35/24
摘要:
A FET is formed on a semiconductor substrate, a curved surface having a radius of curvature is formed on an upper end of an insulation, a portion of a first electrode is exposed corresponding to the curved surface to form an inclined surface, and a region defining a luminescent region is subjected to etching to expose the first electrode. Luminescence emitted from an organic chemical compound layer is reflected by the inclined surface of the first electrode to increase a total quantity of luminescence taken out in a certain direction.
公开/授权文献
- US20030201447A1 Semiconductor device and method of manufacturing same 公开/授权日:2003-10-30
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