发明授权
US07794614B2 Methods for generating sublithographic structures 有权
用于生成亚光刻结构的方法

Methods for generating sublithographic structures
摘要:
One possible embodiment is a method of manufacturing a structure on or in a substrate with the following steps a) positioning at least one spacer structure by a spacer technique on the substrate, b) using at least one of the groups of the spacer structure and a structure generated by the spacer structure as a mask for a subsequent particle irradiation step for generating a latent image in the substrate c) using the latent image for further processing the substrate.
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