发明授权
- 专利标题: Methods for generating sublithographic structures
- 专利标题(中): 用于生成亚光刻结构的方法
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申请号: US11754813申请日: 2007-05-29
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公开(公告)号: US07794614B2公开(公告)日: 2010-09-14
- 发明人: Rolf Weis , Christoph Noelscher
- 申请人: Rolf Weis , Christoph Noelscher
- 申请人地址: DE Munich
- 专利权人: Qimonda AG
- 当前专利权人: Qimonda AG
- 当前专利权人地址: DE Munich
- 代理机构: Slater & Matsil, L.L.P.
- 主分类号: H01L21/302
- IPC分类号: H01L21/302
摘要:
One possible embodiment is a method of manufacturing a structure on or in a substrate with the following steps a) positioning at least one spacer structure by a spacer technique on the substrate, b) using at least one of the groups of the spacer structure and a structure generated by the spacer structure as a mask for a subsequent particle irradiation step for generating a latent image in the substrate c) using the latent image for further processing the substrate.
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