Invention Grant
- Patent Title: Gas-filled discharge gap
- Patent Title (中): 充气放电间隙
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Application No.: US11859586Application Date: 2007-09-21
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Publication No.: US07795810B2Publication Date: 2010-09-14
- Inventor: Juergen Boy , Wolfgang Daeumer , Frank Werner
- Applicant: Juergen Boy , Wolfgang Daeumer , Frank Werner
- Applicant Address: DE Munich
- Assignee: Epcos AG
- Current Assignee: Epcos AG
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Priority: DE102005013499 20050323
- Main IPC: H01J17/00
- IPC: H01J17/00 ; H01J63/04
Abstract:
A gas-filled discharge gap includes at least two electrodes and an electrode-activation mass that is arranged on at least one of the electrodes. The electrode-activation mass contains K2WO4.
Public/Granted literature
- US20080048545A1 Gas-Filled Discharge Gap Public/Granted day:2008-02-28
Information query
