- 专利标题: Gas baffle and distributor for semiconductor processing chamber
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申请号: US12253687申请日: 2008-10-17
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公开(公告)号: US07799704B2公开(公告)日: 2010-09-21
- 发明人: Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
- 申请人: Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Townsend and Townsend and Crew
- 主分类号: H01L21/31
- IPC分类号: H01L21/31 ; H01L21/469
摘要:
Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.