发明授权
- 专利标题: MEMS device and fabrication method of the same
- 专利标题(中): MEMS器件及其制造方法相同
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申请号: US11873008申请日: 2007-10-16
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公开(公告)号: US07800280B2公开(公告)日: 2010-09-21
- 发明人: Hee-moon Jeong , Jin-woo Cho , Yong-hwa Park , Jun-o Kim , Seok-mo Chang
- 申请人: Hee-moon Jeong , Jin-woo Cho , Yong-hwa Park , Jun-o Kim , Seok-mo Chang
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electro-Mechanics Co., Ltd
- 当前专利权人: Samsung Electro-Mechanics Co., Ltd
- 当前专利权人地址: KR Suwon-si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2007-0007915 20070125
- 主分类号: H02N1/00
- IPC分类号: H02N1/00
摘要:
A microelectromechanical systems (MEMS) device includes a frame, an actuator formed on the same layer as the frame and connected to the frame to be capable of performing a relative motion with respect to the frame, and at least one stopper restricting a displacement of the actuator in a direction along the height of the actuator. The MEMS device is fabricated by bonding a second substrate to a first substrate, forming the frame and the actuator by partially removing the first substrate, and forming the at least one stopper by partially removing the second substrate.
公开/授权文献
- US20080179988A1 MEMS DEVICE AND FABRICATION METHOD OF THE SAME 公开/授权日:2008-07-31
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