发明授权
- 专利标题： Epitaxial oxide film, piezoelectric film, piezoelectric film element, liquid discharge head using the piezoelectric film element, and liquid discharge apparatus
- 专利标题（中）： 外延氧化膜，压电膜，压电膜元件，使用压电膜元件的液体排出头以及液体排出装置
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申请号： US11677267申请日： 2007-02-21
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公开(公告)号： US07804231B2公开(公告)日： 2010-09-28
- 发明人: Toshihiro Ifuku , Katsumi Aoki , Takanori Matsuda , Hiroshi Funakubo , Shintaro Yokoyama , Yong Kwan Kim , Hiroshi Nakaki , Rikyu Ikariyama
- 申请人： Toshihiro Ifuku , Katsumi Aoki , Takanori Matsuda , Hiroshi Funakubo , Shintaro Yokoyama , Yong Kwan Kim , Hiroshi Nakaki , Rikyu Ikariyama
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Canon Kabushiki Kaisha,Tokyo Institute of Technology
- 当前专利权人： Canon Kabushiki Kaisha,Tokyo Institute of Technology
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2005-257133 20050905; JP2006-076667 20060320; JP2006-231238 20060828
- 主分类号： H01L41/187
- IPC分类号： H01L41/187
摘要：
Provided are a piezoelectric film, a piezoelectric film element, a liquid discharge head using the piezoelectric film element, and a liquid discharge apparatus. A piezoelectric film element that can be suitably used for a discharge pressure-generating element of a liquid discharge head is obtained by using an epitaxial oxide film composed of a perovskite composite oxide constituted according to a general formula ABO3 as a piezoelectric film. The epitaxial oxide film has at least an A domain and a B domain having a crystal orientation deviation with respect to each other. The crystal orientation deviation between the A domain and the B domain is less than 2°.
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