发明授权
US07806077B2 Plasma nozzle array for providing uniform scalable microwave plasma generation
有权
等离子喷嘴阵列,用于提供均匀可扩展的微波等离子体产生
- 专利标题: Plasma nozzle array for providing uniform scalable microwave plasma generation
- 专利标题(中): 等离子喷嘴阵列,用于提供均匀可扩展的微波等离子体产生
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申请号: US10902435申请日: 2004-07-30
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公开(公告)号: US07806077B2公开(公告)日: 2010-10-05
- 发明人: Sang Hun Lee , Jay Joongsoo Kim
- 申请人: Sang Hun Lee , Jay Joongsoo Kim
- 申请人地址: US CA San Jose JP Wakayama-Shi
- 专利权人: Amarante Technologies, Inc.,Saian Corporation
- 当前专利权人: Amarante Technologies, Inc.,Saian Corporation
- 当前专利权人地址: US CA San Jose JP Wakayama-Shi
- 代理机构: Smith Patent Office
- 主分类号: C23F1/00
- IPC分类号: C23F1/00 ; C23C16/00 ; H01L21/306
摘要:
Microwave plasma nozzle array systems and methods for configuring the microwave plasma nozzle arrays are disclosed. The microwaves are transmitted to a microwave cavity in a specific manner and form an interference pattern that includes high-energy regions within the microwave cavity. The high-energy regions are controlled by the phases and the wavelengths of the microwaves. A plurality of nozzle elements is provided in the array. Each of the nozzle elements has a portion partially disposed in the microwave cavity and receives a gas for passing therethrough. The nozzle elements receive microwave energy from one of the high-energy regions. Each of the nozzle elements include a rod-shaped conductor having a tip that focuses the microwaves and a plasma is then generated using the received gas.
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