发明授权
US07814454B2 Selectable device options for characterizing semiconductor devices
有权
用于表征半导体器件的可选择的器件选项
- 专利标题: Selectable device options for characterizing semiconductor devices
- 专利标题(中): 用于表征半导体器件的可选择的器件选项
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申请号: US11770303申请日: 2007-06-28
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公开(公告)号: US07814454B2公开(公告)日: 2010-10-12
- 发明人: Anthony I. Chou , James S. Dunn , Brian M. Dufrene , Christopher H. Lumbra , Shreesh Narasimha , Christopher S. Putnam , BethAnn Rainey , Christopher M. Schnabel
- 申请人: Anthony I. Chou , James S. Dunn , Brian M. Dufrene , Christopher H. Lumbra , Shreesh Narasimha , Christopher S. Putnam , BethAnn Rainey , Christopher M. Schnabel
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Hoffman Warnick LLC
- 代理商 Anthony Canale
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A system, method and program product that allows multiple devices to be placed between pads such that a Back End Of Line (BEOL) mask change can be used to select different device options. A system is disclosed for implementing a testsite for characterizing devices in an integrated circuit technology, and includes: a system for designing a plurality of device options for a set of chip pads; a system for designing a pseudo wiring layout for each of the plurality of device options; a system for selecting one of the device options; a system for mapping the pseudo wiring layout for a selected device option to a predetermined design level; and a system for outputting a configured mask design at the predetermined design level having a wiring layout mapped for the selected device option.