Invention Grant
US07816656B2 Method of implanting ion species into microstructure products by concurrently cleaning the implanter
有权
通过同时清洁注入机将离子物种植入到微结构产品中的方法
- Patent Title: Method of implanting ion species into microstructure products by concurrently cleaning the implanter
- Patent Title (中): 通过同时清洁注入机将离子物种植入到微结构产品中的方法
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Application No.: US12256128Application Date: 2008-10-22
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Publication No.: US07816656B2Publication Date: 2010-10-19
- Inventor: Christian Krueger , Rastislav Kocis , Marek Braun , Niels-Wieland Hauptmann , Heinz Seidel
- Applicant: Christian Krueger , Rastislav Kocis , Marek Braun , Niels-Wieland Hauptmann , Heinz Seidel
- Applicant Address: US TX Austin
- Assignee: Advanced Micro Devices, Inc.
- Current Assignee: Advanced Micro Devices, Inc.
- Current Assignee Address: US TX Austin
- Agency: Williams, Morgan & Amerson
- Priority: GB102008011929.6 20080229
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/08 ; H01J49/10
Abstract:
By operating an implantation tool with a source gas having a halogen fraction of 66 atomic percent or less relative to the total composition of the source gas, an in situ cleaning effect may be achieved while performing an implantation process.
Public/Granted literature
- US20090221136A1 METHOD OF IMPLANTING ION SPECIES INTO MICROSTRUCTURE PRODUCTS BY CONCURRENTLY CLEANING THE IMPLANTER Public/Granted day:2009-09-03
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