Invention Grant
- Patent Title: Pattern inspection apparatus and method
- Patent Title (中): 图案检验装置及方法
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Application No.: US11058616Application Date: 2005-02-16
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Publication No.: US07817844B2Publication Date: 2010-10-19
- Inventor: Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto
- Applicant: Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto
- Applicant Address: JP Tokyo
- Assignee: NanoGeometry Research Inc.
- Current Assignee: NanoGeometry Research Inc.
- Current Assignee Address: JP Tokyo
- Agency: Lathrop & Gage LLP
- Priority: JP11-239586 19990826; JP2000-078847 20000321; JP2002-307406 20021022; JP2004-047098 20040223
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06K9/48 ; G06K9/62

Abstract:
A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
Public/Granted literature
- US20050146714A1 Pattern inspection apparatus and method Public/Granted day:2005-07-07
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