公开(公告)号：US07817844B2

公开(公告)日：2010-10-19

申请号：US11058616

申请日：2005-02-16

Applicant: Tadashi Kitamura ,  Kazufumi Kubota ,  Shinichi Nakazawa ,  Neeti Vohra ,  Masahiro Yamamoto

Inventor： Tadashi Kitamura ,  Kazufumi Kubota ,  Shinichi Nakazawa ,  Neeti Vohra ,  Masahiro Yamamoto

IPC: G06K9/00 ,  G06K9/48 ,  G06K9/62

CPC classification number: G06K9/00 ,  G06K2209/19 ,  G06T7/0004 ,  G06T2207/30148

Abstract: A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.

Abstract translation: 图案检查装置用于通过使用要检查的图案的图像和用于制造待图案的图案的设计数据来检查诸如半导体集成电路（LSI），液晶面板和光掩模的图案， 检查。 图案检查装置包括：参考图案生成装置，用于从设计数据生成由一条或多条线表示的参考图案;图像生成装置，用于生成被检查图案的图像;检测装置， 要检查的图案的图像;以及检查装置，用于通过将待检查图案的图像的边缘与参考图案的一条或多条线进行比较来检查待检查的图案。

公开(公告)号：US07796801B2

公开(公告)日：2010-09-14

申请号：US11434797

申请日：2006-05-17

Applicant: Tadashi Kitamura ,  Kazufumi Kubota ,  Shinichi Nakazawa ,  Neeti Vohra ,  Masahiro Yamamoto ,  Toshiaki Hasebe

Inventor： Tadashi Kitamura ,  Kazufumi Kubota ,  Shinichi Nakazawa ,  Neeti Vohra ,  Masahiro Yamamoto ,  Toshiaki Hasebe

IPC: G06K9/00 ,  G06K9/48 ,  G06K9/62

CPC classification number: G06K9/2054 ,  G06K9/00 ,  G06K9/036 ,  G06K9/48 ,  G06K2209/19 ,  G06T7/0004 ,  G06T7/001 ,  G06T2207/30148 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2817

Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.

Abstract translation: 基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是 由图案检查装置检查。 用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。 图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测 要检查的图案的边缘，以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案， 参考模式。

公开(公告)号：US07660455B2

公开(公告)日：2010-02-09

申请号：US11044159

申请日：2005-01-28

Applicant: Masahiro Yamamoto ,  Tadashi Kitamura

Inventor： Masahiro Yamamoto ,  Tadashi Kitamura

IPC: G06K9/00 ,  G06K9/48 ,  G06K9/62

CPC classification number: G06K9/00 ,  G06K9/6206 ,  G06K2209/19 ,  G06T7/001 ,  G06T7/12 ,  G06T2207/30121 ,  G06T2207/30148

Abstract: First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1 can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2 can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2. Using the second reference pattern so shifted, a profile is obtained on the pattern image to-be-inspected and the second edge is detected. Then, by comparing the second edge and the edge of the second reference pattern so shifted, the pattern to-be-inspected is inspected. Also in this second inspection, the pattern deformation quantities are obtained and defects are detected. A shift quantity S3 can be obtained as one of the pattern deformation quantities.

Abstract translation: 首先，图案检查装置从要检查的图案的图像检测第一边缘。 接下来，图案检查装置通过比较第一参考图案的第一边缘和边缘来进行被检查图案的图像与第一参考图案的匹配。 由于作为匹配的结果，可以获得移位量S1，然后第一基准图案偏移该移位量S1。 随后，通过比较如此偏移的第一参考图案的第一边缘和边缘来检查待检查的图案。 在该第一检查中，获得图案变形量并检测缺陷。 作为图案变形量之一，可以获得偏移量S2。 接下来，为了从要检查的图案图像检测第二边缘，相应的第二参考图案偏移了移位量S1 + S2。 使用这样偏移的第二参考图案，在待检查的图案图像上获得轮廓并检测第二边缘。 然后，通过比较如此移动的第二参考图案的第二边缘和边缘，检查待检查的图案。 此外，在该第二检查中，获得图案变形量并检测缺陷。 可以获得作为图案变形量之一的偏移量S3。