发明授权
US07819979B1 Method and system for cleaning magnetic artifacts using a carbonyl reactive ion etch
有权
使用羰基反应离子蚀刻清洁磁伪影的方法和系统
- 专利标题： Method and system for cleaning magnetic artifacts using a carbonyl reactive ion etch
- 专利标题（中）： 使用羰基反应离子蚀刻清洁磁伪影的方法和系统
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申请号： US11046972申请日： 2005-01-31
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公开(公告)号： US07819979B1公开(公告)日： 2010-10-26
- 发明人: Benjamin Chen , Yun-Fei Li , Hugh C. Hiner , Wei Zhang , Yingjian Chen
- 申请人： Benjamin Chen , Yun-Fei Li , Hugh C. Hiner , Wei Zhang , Yingjian Chen
- 申请人地址： US CA Fremont
- 专利权人： Western Digital (Fremont), LLC
- 当前专利权人： Western Digital (Fremont), LLC
- 当前专利权人地址： US CA Fremont
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; B08B7/04
摘要：
A method and system for providing a magnetic structure that includes at least one magnetic material is disclosed. The method and system include defining the magnetic structure. The magnetic structure also includes a top layer that is insensitive to an istroropic carbonyl reactive ion etch. The defining of the magnetic structure results in at least one artifact. The method and system further includes cleaning the at least one artifact using at least one isotropic carbonyl reactive ion etch.