发明授权
- 专利标题: Particulate silica
- 专利标题(中): 颗粒状二氧化硅
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申请号: US11920567申请日: 2005-05-19
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公开(公告)号: US07824644B2公开(公告)日: 2010-11-02
- 发明人: Yasuhiro Nagatani , Ryuji Ishimoto , Masao Ariyuki
- 申请人: Yasuhiro Nagatani , Ryuji Ishimoto , Masao Ariyuki
- 申请人地址: JP Shunan-shi
- 专利权人: Tokuyama Corporation
- 当前专利权人: Tokuyama Corporation
- 当前专利权人地址: JP Shunan-shi
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 国际申请: PCT/JP2005/009582 WO 20050519
- 国际公布: WO2006/123433 WO 20061123
- 主分类号: C01B33/12
- IPC分类号: C01B33/12 ; B01D19/24 ; B60C1/00
摘要:
There is provided particulate silica which can be suitably used as a viscoelasticity modifier such as a thickener which is added to liquid such as water, a liquid resin or paint to adjust its viscoelastic properties such as viscosity and thixotropic nature, a reinforcer or filler for silicone rubber or sealants, a polishing agent for CMP (Chemical Mechanical Polishing) or a surface coating agent for ink-jet printing paper.The particulate silica has a BET specific surface area S of 130 to 380 m2/g, and its fractal shape parameter α1 in an α-value analysis target range of 20 to 30 nm satisfies the following equation (1) and its fractal shape parameter α2 in an α-value analysis target range of 30 to 50 nm satisfies the following equation (2). α1+0.00175S
公开/授权文献
- US20090230351A1 Particulate silica 公开/授权日:2009-09-17
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