摘要:
There is provided particulate silica which can be suitably used as a viscoelasticity modifier such as a thickener which is added to liquid such as water, a liquid resin or paint to adjust its viscoelastic properties such as viscosity and thixotropic nature, a reinforcer or filler for silicone rubber or sealants, a polishing agent for CMP (Chemical Mechanical Polishing) or a surface coating agent for ink-jet printing paper.The particulate silica has a BET specific surface area S of 130 to 380 m2/g, and its fractal shape parameter α1 in an α-value analysis target range of 20 to 30 nm satisfies the following equation (1) and its fractal shape parameter α2 in an α-value analysis target range of 30 to 50 nm satisfies the following equation (2). α1+0.00175S
摘要:
A single crystal of magnesium fluoride having a large diameter and excellent optical properties such as internal transmittance and long term laser durability, and suited for use as optical elements for exposing apparatus. The single crystal of magnesium fluoride is of a cylindrical shape having a straight body portion of a diameter of not smaller than 10 cm, has an internal transmittance of at least 85%/cm at 120 nm and at least 98%/cm at 193 nm and has, desirably, an induced absorption of not larger than 0.0030 absorption/cm at 255 nm and, particularly desirably, not larger than 0.0010 absorption/cm. at 255 nm immediately after the irradiation with 2 million shorts of an ArF excimer laser of an energy density of 30 mJ/cm2 and 2000 Hz. The invention further provides an optical element for optical lithography comprising the single crystal and an optical member for vacuum ultraviolet ray transmission comprising the single crystal.
摘要翻译:具有大直径且具有优异的光学性质如内部透射率和长期激光耐久性的氟化镁的单晶,并且适合用作曝光装置的光学元件。 氟化镁的单晶是具有直径不小于10cm的直体部分的圆柱形状,在120nm处具有至少85%/ cm的内部透射率,在193nm具有至少98%/ cm 3的内部透射率 并且理想地,在255nm处,特别优选不大于0.0010吸收/ cm 3的吸收/ cm 3的诱导吸收。 在用200万短的能量密度为30mJ / cm 2和2000Hz的ArF准分子激光器照射后立即在255nm处。 本发明还提供了一种用于光学光刻的光学元件,其包括单晶和用于包括单晶的真空紫外线透射的光学构件。
摘要:
There is provided particulate silica which can be suitably used as a viscoelasticity modifier such as a thickener which is added to liquid such as water, a liquid resin or paint to adjust its viscoelastic properties such as viscosity and thixotropic nature, a reinforcer or filler for silicone rubber or sealants, a polishing agent for CMP (Chemical Mechanical Polishing) or a surface coating agent for ink-jet printing paper.The particulate silica has a BET specific surface area S of 130 to 380 m2/g, and its fractal shape parameter α1 in an α-value analysis target range of 20 to 30 nm satisfies the following equation (1) and its fractal shape parameter α2 in an α-value analysis target range of 30 to 50 nm satisfies the following equation (2). α1+0.00175S
摘要:
A sintered ceramics for mounting a light-emitting element, which is capable of realizing high optical reflectance over the entire region from ultraviolet radiation to visible light. The sintered ceramics has a light-reflective face of which reflectance to light in each wavelength in the range of 250 nm˜750 nm is 70% or more. The light-reflective face satisfies following reaction: |RA−RB|≦20 when reflectance to light of 750 nm is defined as RA%, and reflectance to light of 300 nm is defined as RB. The sintered ceramics has not layer to be peeled from the light-reflective face when a Tape Peeling Test is carried out to the light-reflective face in accordance with the method described in JIS H8504 (1990).
摘要翻译:一种用于安装发光元件的烧结陶瓷,其能够在从紫外线到可见光的整个区域上实现高的光反射率。 烧结陶瓷具有在250nm〜750nm的范围内的各波长的光的反射率为70%以上的光反射面。 光反射面满足以下反应:<?in-line-formula description =“In-line formula”end =“lead”?> | R sub> B SUB 当反射率为750nm的光被定义为R A A%时,| | <= 20 <?in-line-formula description =“In-line Formulas”end =“tail”?> 将300nm的光定义为R B B。 当根据JIS H8504(1990)中描述的方法对光反射面进行剥皮试验时,烧结陶瓷没有从光反射面剥离的层。
摘要:
A non-oxide ceramics having improved performances and functions by forming a high-quality oxide film on the surface of a non-oxide ceramics such as aluminum nitride. The method for the formation of the non-oxide ceramics comprises the steps of: (1) providing a non-oxide ceramics; (2) introducing the non-oxide ceramics into a furnace and then regulating the atmosphere within the furnace so as to have an oxidizing gas content of not more than 0.5 mmol in terms of total number of moles of the oxidizing gas per m3 of the inside of the furnace; (3) heating the non-oxide ceramics to a temperature at or above a temperature, which is 300° C. below the oxidation start temperature of the non-oxide ceramics, while maintaining the low-oxidizing gas atmosphere and (4) bringing the non-oxide ceramics heated in the step (3) into contact with an oxidizing gas and then holding the non-oxide ceramics at a temperature above the oxidation start temperature of the non-oxide ceramics to form an oxide layer, and that, in the step (4), until at least two min. elapses after the arrival of the temperature at or above the oxidation start temperature after the start of the contact between the non-oxide ceramics and the oxidizing gas, the pressure or partial pressure of the oxidizing gas is maintained at not more than 50 kPa.