发明授权
- 专利标题： Photoacid generator compounds and compositions
- 专利标题（中）： 光酸发生剂化合物和组合物
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申请号： US12255266申请日： 2008-10-21
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公开(公告)号： US07824839B2公开(公告)日： 2010-11-02
- 发明人: Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
- 申请人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
- 申请人地址： US NY Ithaca
- 专利权人： Cornell Research Foundation, Inc.
- 当前专利权人： Cornell Research Foundation, Inc.
- 当前专利权人地址： US NY Ithaca
- 代理机构： Schwegman, Lundberg & Woessner, P.A.
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004 ; G03F7/029 ; C07C303/00 ; C07D307/00
摘要：
The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
公开/授权文献
- US20090136868A1 PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS 公开/授权日：2009-05-28
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