发明授权
- 专利标题: Integrated thermal structures and fabrication methods thereof facilitating implementing a cell phone or other electronic system
- 专利标题(中): 集成的热结构及其制造方法有助于实现手机或其他电子系统
-
申请号: US12144717申请日: 2008-06-24
-
公开(公告)号: US07830000B2公开(公告)日: 2010-11-09
- 发明人: Charles W. Eichelberger , James E. Kohl
- 申请人: Charles W. Eichelberger , James E. Kohl
- 申请人地址: US MA Woburn
- 专利权人: Epic Technologies, Inc.
- 当前专利权人: Epic Technologies, Inc.
- 当前专利权人地址: US MA Woburn
- 代理机构: Heslin Rothenberg Farley & Mesiti P.C.
- 代理商 Kevin P. Radigan, Esq.
- 主分类号: H01L23/34
- IPC分类号: H01L23/34
摘要:
Circuit structures and methods of fabrication are provided for facilitating implementing a complete electronic system in a compact package. The circuit structure includes, in one embodiment, a chips-first multichip base layer with conductive structures extending therethrough. An interconnect layer is disposed over the front surface of the multichip layer and includes interconnect metallization electrically connected to contact pads of the chips and to conductive structures extending through the structural material. A redistribution layer, disposed over the back surface of the multichip layer, includes a redistribution metallization also electrically connected to conductive structures extending through the structural material. Input/output contacts are arrayed over the redistribution layer, including over the lower surfaces of at least some integrated circuit chips within the multichip layer, and are electrically connected through the redistribution metallization, conductive structures, and interconnect metallization to contact pads of the integrated circuit chips of the multichip layer.
公开/授权文献
信息查询
IPC分类: