Invention Grant
US07831083B1 Image quality monitoring for substrate inspection 有权
基板检查图像质量监控

Image quality monitoring for substrate inspection
Abstract:
A method for monitoring the stability of an inspection or processing of a substrate, a substrate inspection system and a processor readable medium are disclosed. One or more images of one or more portions of the substrate may be obtained from an inspection tool. Image quality information may be extracted from the one or more images. The image quality information may be analyzed to monitor stability of the inspection tool and/or to determine variation of a process performed on the substrate.
Information query
Patent Agency Ranking
0/0