Image quality monitoring for substrate inspection
    1.
    发明授权
    Image quality monitoring for substrate inspection 有权
    基板检查图像质量监控

    公开(公告)号:US07831083B1

    公开(公告)日:2010-11-09

    申请号:US11457213

    申请日:2006-07-13

    申请人: Jan Lauber

    发明人: Jan Lauber

    IPC分类号: G06K9/00 G06K9/48

    摘要: A method for monitoring the stability of an inspection or processing of a substrate, a substrate inspection system and a processor readable medium are disclosed. One or more images of one or more portions of the substrate may be obtained from an inspection tool. Image quality information may be extracted from the one or more images. The image quality information may be analyzed to monitor stability of the inspection tool and/or to determine variation of a process performed on the substrate.

    摘要翻译: 公开了一种用于监测基板,基板检查系统和处理器可读介质的检查或处理的稳定性的方法。 可以从检查工具获得衬底的一个或多个部分的一个或多个图像。 可以从一个或多个图像中提取图像质量信息。 可以分析图像质量信息以监测检查工具的稳定性和/或确定在衬底上执行的处理的变化。

    Automated inspection using cell-cell subtraction perpendicular to stage motion direction
    2.
    发明授权
    Automated inspection using cell-cell subtraction perpendicular to stage motion direction 有权
    使用垂直于舞台运动方向的细胞细胞减法进行自动检查

    公开(公告)号:US08106355B1

    公开(公告)日:2012-01-31

    申请号:US12163708

    申请日:2008-06-27

    IPC分类号: G21K7/00

    摘要: One embodiment relates to an apparatus for automated inspection of a semiconductor substrate. Processor-executable code is configured to control the stage electronics to move the substrate using a continuous motion in a substrate-translation direction and is configured to control the beam to scan it across the surface of the substrate and collect corresponding image data, scan lines of the scan being along a scan-line direction perpendicular to the substrate-translation direction. Processor-executable code is also configured to select from the image data two cells of the repeating pattern on the surface of the substrate, the two cells being displaced from each other by one or multiple cell heights in the scan-line direction. Finally, processor-executable code is configured to generate a difference image by subtracting image data from said two cells on a pixel-by-pixel basis. Other embodiments, aspects and features are also disclosed.

    摘要翻译: 一个实施例涉及用于半导体衬底的自动检查的设备。 处理器可执行代码被配置为控制平台电子设备以使其在基板平移方向上使用连续运动来移动基板,并且被配置成控制该波束跨越基板的表面进行扫描,并收集相应的图像数据,扫描线 扫描沿着垂直于衬底平移方向的扫描线方向。 处理器可执行代码还被配置为从图像数据中选择基板表面上的重复图案的两个单元,两个单元在扫描线方向上彼此移位一个或多个单元格高度。 最后,处理器可执行代码被配置为通过以逐个像素为基础从所述两个单元中减去图像数据来生成差分图像。 还公开了其它实施例,方面和特征。

    In-situ probe for optimizing electron beam inspection and metrology based on surface potential
    3.
    发明授权
    In-situ probe for optimizing electron beam inspection and metrology based on surface potential 失效
    基于表面电位优化电子束检测和计量的原位探针

    公开(公告)号:US06664546B1

    公开(公告)日:2003-12-16

    申请号:US09502554

    申请日:2000-02-10

    IPC分类号: H01J3721

    摘要: Disclosed is a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator arranged to generate and control a charged particle beam substantially towards a portion of the sample and a detector arranged to detect charged particles originating from the sample portion to allow generation of an image from the detected charged particles. The apparatus further includes a measurement device arranged to measure a characteristic of the sample portion to obtain a surface voltage value of the sample portion that is exposed to the charged particle beam. For example, the measurement device is an electrostatic voltmeter positioned to obtain a surface voltage value of the exposed sample portion. A charged particle beam is directed substantially towards a portion of the sample under a first set of operating conditions. A surface charge value of the sample portion is obtained under the first set of operating conditions. It is then determined whether an optimum set of operating conditions associated with a predetermined surface charge value have been found. When the optimum conditions have not been found, the operating conditions are adjusted and the charged particle beam is directed substantially towards the sample portion. When the optimum conditions have been found, the charged particle beam is directed substantially towards the sample portion under the found optimum operating conditions.

    摘要翻译: 公开了一种用于从样本生成图像的方法和装置。 该装置包括带电粒子束发生器,其布置成基本上朝向样品的一部分产生并控制带电粒子束;以及检测器,被布置成检测源自样品部分的带电粒子,以允许从检测到的带电粒子产生图像。 该装置还包括测量装置,其被配置为测量样品部分的特性以获得暴露于带电粒子束的样品部分的表面电压值。 例如,测量装置是定位成获得暴露的样品部分的表面电压值的静电电压表。 在第一组操作条件下,带电粒子束基本上指向样品的一部分。 在第一组操作条件下获得样品部分的表面电荷值。 然后确定是否已经找到与预定表面电荷值相关联的最佳操作条件集合。 当没有发现最佳条件时,调节操作条件并且带电粒子束基本上朝向样品部分。 当已经找到最佳条件时,在找到的最佳操作条件下,带电粒子束基本上指向样品部分。