发明授权
- 专利标题: Channel method for forming a capacitor
- 专利标题(中): 用于形成电容器的通道方法
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申请号: US12098593申请日: 2008-04-07
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公开(公告)号: US07833292B2公开(公告)日: 2010-11-16
- 发明人: Keith R. Brenneman , Chris Wayne , Chris Stolarski , John T Kinard , Alethia Melody , Gregory J. Dunn , Remy J. Chelini , Robert T. Croswell
- 申请人: Keith R. Brenneman , Chris Wayne , Chris Stolarski , John T Kinard , Alethia Melody , Gregory J. Dunn , Remy J. Chelini , Robert T. Croswell
- 申请人地址: US SC Greenville
- 专利权人: KEMET Electronics Corporation
- 当前专利权人: KEMET Electronics Corporation
- 当前专利权人地址: US SC Greenville
- 代理机构: Nexsen Pruet, LLC
- 代理商 Joseph T. Guy
- 主分类号: H01G9/00
- IPC分类号: H01G9/00
摘要:
An improved method for forming a capacitor. The method includes providing a carrier with a channel therein, providing a metal foil with a valve metal with a first dielectric on a first face of the metal foil, securing the metal foil into the channel with the first dielectric away from a channel floor, inserting an insulative material between the metal foil and each side wall of the channel, forming a cathode layer on the first dielectric between the insulative material, forming a conductive layer on the cathode layer and in electrical contact with the carrier, lap cutting the carrier parallel to the metal foil such that the valve metal is exposed, and dice cutting to form singulated capacitors.
公开/授权文献
- US20080273291A1 Channel Method For Forming A Capacitor 公开/授权日:2008-11-06
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