发明授权
- 专利标题: Method of reducing temperature difference between a pair of substrates
- 专利标题(中): 降低一对基板之间的温度差的方法
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申请号: US11689640申请日: 2007-03-22
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公开(公告)号: US07838300B2公开(公告)日: 2010-11-23
- 发明人: Kak Namkoong , Su-hyeon Kim , Jin-tae Kim , Chin-sung Park , Young-sun Lee
- 申请人: Kak Namkoong , Su-hyeon Kim , Jin-tae Kim , Chin-sung Park , Young-sun Lee
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Cantor Colburn LLP
- 优先权: KR10-2006-0084819 20060904
- 主分类号: G01N25/20
- IPC分类号: G01N25/20 ; B01L3/02
摘要:
A method of reducing a temperature difference between a high-temperature and a low-temperature substrate includes interposing a heat transfer facilitating layer which has a higher thermal conductivity than air and can hold particles between the substrates, and maintaining close contact between the high-temperature substrate, the heat transfer facilitating layer, and the low-temperature substrate, wherein formation of an air layer can be at least substantially prevented between the high-temperature substrate and the heat transfer facilitating layer, and between the low-temperature substrate and the heat transfer facilitating layer.
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