发明授权
- 专利标题： Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide
- 专利标题（中）： 用于光波导形成的光敏树脂组合物，光波导和用于制造光波导的方法
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申请号： US12092679申请日： 2006-11-01
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公开(公告)号： US07847017B2公开(公告)日： 2010-12-07
- 发明人: Katsumi Maeda , Kaichiro Nakano
- 申请人： Katsumi Maeda , Kaichiro Nakano
- 申请人地址： JP Tokyo
- 专利权人： NEC Corporation
- 当前专利权人： NEC Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2005-326225 20051110
- 国际申请： PCT/JP2006/321855 WO 20061101
- 国际公布： WO2007/055134 WO 20070518
- 主分类号： G02B6/00
- IPC分类号： G02B6/00 ; B29D11/00 ; C09K11/06
摘要：
The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape accuracy at low cost; an optical waveguide; and a method for producing an optical waveguide. The present invention provides a photosensitive resin composition for optical waveguide formation comprising at least: a polymer containing at least a (meth)acrylate structure unit having an epoxy structure, and a (meth)acrylate structure unit having a lactone structure and/or a vinyl monomer structure unit having an aromatic structure; and a photoacid generator, of which one or both of a core layer and a cladding layer are formed of a cured product.
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