发明授权
- 专利标题: Magnetic memory device and method of fabricating the same
- 专利标题(中): 磁记忆装置及其制造方法
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申请号: US12507504申请日: 2009-07-22
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公开(公告)号: US07851878B2公开(公告)日: 2010-12-14
- 发明人: Woo-Yeong Cho , Yun-Seung Shin , Hyun-Geun Byun , Choong-Keun Kwak
- 申请人: Woo-Yeong Cho , Yun-Seung Shin , Hyun-Geun Byun , Choong-Keun Kwak
- 申请人地址: KR Suwon-Si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-Si
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR10-2005-0078365 20050825
- 主分类号: H01L29/82
- IPC分类号: H01L29/82 ; G11C11/02
摘要:
A magnetic memory device includes a common line; a first write-in diode, a readout diode and a second write-in diode being connected to the common line in parallel. The magnetic memory device further includes a magnetic tunnel junction structure connected to the readout diode, first and second write-in conductors disposed at both sides of the magnetic tunnel junction structure and connected to the first and second write-in diodes, respectively and a first write-in line, a readout line and a second write-in line, which are connected to the first write-in conductor, the magnetic tunnel injection structure, and the second write-in conductor, respectively.
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