发明授权
- 专利标题: Method for measuring surface profile, and apparatus using the same
- 专利标题(中): 测量表面轮廓的方法及使用其的装置
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申请号: US12162788申请日: 2007-01-26
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公开(公告)号: US07852489B2公开(公告)日: 2010-12-14
- 发明人: Masashi Sugiyama , Hidemitsu Ogawa , Katsuichi Kitagawa , Kazuyoshi Suzuki
- 申请人: Masashi Sugiyama , Hidemitsu Ogawa , Katsuichi Kitagawa , Kazuyoshi Suzuki
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Tokyo Institute of Technology,Toray Engineering Co., Ltd.
- 当前专利权人: Tokyo Institute of Technology,Toray Engineering Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Cheng Law Group, PLLC
- 优先权: JP2006-024825 20060201
- 国际申请: PCT/JP2007/051268 WO 20070126
- 国际公布: WO2007/088789 WO 20070809
- 主分类号: G01B11/02
- IPC分类号: G01B11/02
摘要:
A reference plane is arranged in a posture obliquely tilted at an optional angle relative to a traveling direction of a light-beam, so that an interference fringe is generated from the reflected light-beams which are reflected from a target plane and the reference plane and, then, return on a single optical path. An image of the interference fringe is taken by a CCD camera to acquire intensity value data of each pixel. A phase of an interference fringe waveform is obtained for each pixel by a CPU by fitting the intensity value data to a model equation expressing the interference fringe waveform, where the intensity value data contain that of each pixel and those of the pixels in the vicinity of the relevant pixel, on assumption that DC components, AC amplitudes and phases of the interference fringe waveforms are respectively constant in the vicinity of the relevant pixel. The obtained phase is converted into a height to measure a surface profile.
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