发明授权
- 专利标题： Method of fabricating an ultra-small condenser microphone
- 专利标题（中）： 制造超小型电容麦克风的方法
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申请号： US12265431申请日： 2008-11-05
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公开(公告)号： US07855095B2公开(公告)日： 2010-12-21
- 发明人: Yoshiyuki Miyashita , Kazumoto Doi , Tadao Imai , Hiroaki Iwaseki
- 申请人： Yoshiyuki Miyashita , Kazumoto Doi , Tadao Imai , Hiroaki Iwaseki
- 申请人地址： JP Osaka
- 专利权人： Panasonic Corporation
- 当前专利权人： Panasonic Corporation
- 当前专利权人地址： JP Osaka
- 代理机构： McDermott Will & Emery LLP
- 优先权： JP2007-297687 20071116
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H04R31/00
摘要：
In the present invention, a semiconductor substrate wherein a plurality of MEMS microphones is formed is disposed opposed to a discharge electrode in a state of being stuck on a sheet. Electretization of a dielectric film provided in the MEMS microphone is performed by irradiating the dielectric film between a fixed electrode and a vibration film provided in the MEMS microphone with ions resulting from a corona discharge of the discharge electrode in a state that a predetermined potential difference is applied to the fixed electrode and the vibration film and fixing charges based on the ions to the dielectric film. The electretization is successively performed to each MEMS microphone on the semiconductor substrate by relatively moving the semiconductor substrate and the discharge electrode. Therefore, electretization of the dielectric film in the MEMS microphone chip is realized using a low-cost and simple fabricating equipment and productivity can be enhanced.
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