发明授权
- 专利标题： Superconducting thin film material and method of manufacturing the same
- 专利标题（中）： 超导薄膜材料及其制造方法
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申请号： US12299141申请日： 2007-04-20
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公开(公告)号： US07858558B2公开(公告)日： 2010-12-28
- 发明人: Shuji Hahakura , Kazuya Ohmatsu , Munetsugu Ueyama , Katsuya Hasegawa
- 申请人： Shuji Hahakura , Kazuya Ohmatsu , Munetsugu Ueyama , Katsuya Hasegawa
- 申请人地址： JP Osaka-shi, Osaka JP Tokyo
- 专利权人： Sumitomo Electric Industries, Ltd.,International Superconductivity Technology Center, the Juridical Foundation
- 当前专利权人： Sumitomo Electric Industries, Ltd.,International Superconductivity Technology Center, the Juridical Foundation
- 当前专利权人地址： JP Osaka-shi, Osaka JP Tokyo
- 代理机构： Drinker Biddle & Reath LLP
- 优先权： JP2006-140172 20060519
- 国际申请： PCT/JP2007/058657 WO 20070420
- 国际公布： WO2007/135832 WO 20071129
- 主分类号： H01L39/12
- IPC分类号： H01L39/12 ; H01L29/06 ; B05D5/12
摘要：
A superconducting thin film material that can realize attainment of an excellent property such as a high JC and a high IC and reduction of costs at the same time includes an orientated metal substrate and an oxide superconductor film formed on the orientated metal substrate. The oxide superconductor film includes a physical vapor deposition HoBCO layer formed by a physical vapor deposition method, and a metal organic deposition HoBCO layer formed on the physical vapor deposition HoBCO layer by a metal organic deposition method.