发明授权
- 专利标题： Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
- 专利标题（中）： 具有多层膜的光学元件的评价方法和制造方法，具有该多层膜的曝光装置及其制造方法
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申请号： US12466890申请日： 2009-05-15
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公开(公告)号： US07858958B2公开(公告)日： 2010-12-28
- 发明人: Takeshi Miyachi , Akira Miyake
- 申请人： Takeshi Miyachi , Akira Miyake
- 申请人地址： JP
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP
- 代理机构： Rossi, Kimms & McDowell LLP
- 优先权： JP2004-139060 20040507
- 主分类号： G01B11/24
- IPC分类号： G01B11/24 ; G03B21/00
摘要：
A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.
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