发明授权
- 专利标题: Semiconductor devices including channel and junction regions of different semiconductor materials
- 专利标题(中): 半导体器件包括不同半导体材料的沟道和结区
-
申请号: US11849577申请日: 2007-09-04
-
公开(公告)号: US07859064B1公开(公告)日: 2010-12-28
- 发明人: Chang-woo Oh , Dong-gun Park , Dong-won Kim , Sung-dae Suk
- 申请人: Chang-woo Oh , Dong-gun Park , Dong-won Kim , Sung-dae Suk
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Myers Bigel Sibley & Sajovec, P.A.
- 优先权: KR10-2004-0058785 20040727
- 主分类号: H01L29/41
- IPC分类号: H01L29/41
摘要:
A semiconductor device may include a substrate, an active semiconductor region of the substrate, and a gate electrode. The active semiconductor region may include a channel region between first and second junction regions. The channel region may include a first semiconductor material, the first and second junction regions may include a second semiconductor material, and the first and second semiconductor materials may be different. The gate electrode may be on the channel region with portions of the first and second junction regions being free of the gate electrode.
信息查询
IPC分类: