发明授权
- 专利标题: Focused negative ion beam field source
- 专利标题(中): 聚焦负离子束场源
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申请号: US12135464申请日: 2008-06-09
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公开(公告)号: US07863581B2公开(公告)日: 2011-01-04
- 发明人: Paulo Lozano , Manuel Martinez-Sanchez
- 申请人: Paulo Lozano , Manuel Martinez-Sanchez
- 申请人地址: US MA Cambridge
- 专利权人: Massachusetts Institute of Technology
- 当前专利权人: Massachusetts Institute of Technology
- 当前专利权人地址: US MA Cambridge
- 代理机构: Proskauer Rose LLP
- 主分类号: H01J27/00
- IPC分类号: H01J27/00
摘要:
An apparatus for producing negative ions including an emitter coated with an ionic liquid room-temperature molten salt, an electrode positioned downstream relative to the emitter, a power supply that applies a voltage to the emitter with respect to the electrode. The power supply is sufficient to generate a stable high brightness beam of negative ions having minimal chromatic and spherical aberrations in the beam. An electrostatic lens and deflector is used to focus and direct the beam to a target.
公开/授权文献
- US20090032724A1 FOCUSED NEGATIVE ION BEAM FIELD SOURCE 公开/授权日:2009-02-05
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