Invention Grant
US07863583B2 Device and process for curing using energy-rich radiation in an inert gas atmosphere
失效
在惰性气体环境中使用能量丰富的辐射固化的装置和方法
- Patent Title: Device and process for curing using energy-rich radiation in an inert gas atmosphere
- Patent Title (中): 在惰性气体环境中使用能量丰富的辐射固化的装置和方法
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Application No.: US11629195Application Date: 2005-06-17
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Publication No.: US07863583B2Publication Date: 2011-01-04
- Inventor: Andreas Daiss , Erich Beck , Manfred Biehler
- Applicant: Andreas Daiss , Erich Beck , Manfred Biehler
- Applicant Address: DE Ludwigshafen
- Assignee: BASF Aktiengesellschaft
- Current Assignee: BASF Aktiengesellschaft
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, Sivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102004030674 20040624
- International Application: PCT/EP2005/006549 WO 20050617
- International Announcement: WO2006/000349 WO 20060105
- Main IPC: G21K5/02
- IPC: G21K5/02 ; G21K5/10
Abstract:
The invention relates to an apparatus and a method of producing molding materials and coatings on substrates by curing radiation-curable materials under an inert gas atmosphere by exposure to high-energy radiation.
Public/Granted literature
- US20080311309A1 Device and Process for Curing Using Energy-Rich Radiation in an Inert Gas Atmosphere Public/Granted day:2008-12-18
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