发明授权
- 专利标题: Wave absorber and manufacturing method of wave absorber
- 专利标题(中): 波浪吸收器及其制造方法
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申请号: US10598345申请日: 2005-02-25
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公开(公告)号: US07864095B2公开(公告)日: 2011-01-04
- 发明人: Yoshiyuki Masuda , Noboru Otani , Hisamatsu Nakano
- 申请人: Yoshiyuki Masuda , Noboru Otani , Hisamatsu Nakano
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址: JP Tokyo
- 代理机构: Wood, Herron & Evans, LLP
- 优先权: JP2004-055051 20040227; JP2004-265233 20040913; JP2004-371225 20041222
- 国际申请: PCT/JP2005/003194 WO 20050225
- 国际公布: WO2005/084097 WO 20050909
- 主分类号: H01Q17/00
- IPC分类号: H01Q17/00
摘要:
The problem of the present invention is to offer a wave absorber that has reflection attenuation capability sufficient to enable prevention of communication disturbances due to reflection and the like of EM waves, that enables greater thinness and lighter weight, and that has wide-band attenuation properties, as well as a manufacturing method of the wave absorber. The wave absorber of the present invention has a structure which sequentially laminates a grid-like conductor layer composed of an electric conductor, a first dielectric layer, a high-resistance conductor layer having a surface resistivity within a prescribed range, a second dielectric layer, and a pattern layer having multiple patterns composed of an electric conductor, wherein each pattern in said pattern layer differs in either or both of size and form relative to another adjacent pattern.
公开/授权文献
- US20080212304A1 Wave Absorber and Manufacturing Method of Wave Absorber 公开/授权日:2008-09-04
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