发明授权
- 专利标题： Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
- 专利标题（中）： 清洁装置，光刻设备和光刻设备清洁方法
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申请号： US12081171申请日： 2008-04-11
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公开(公告)号： US07866330B2公开(公告)日： 2011-01-11
- 发明人: Bauke Jansen , Raymond Gerardus Marius Beeren , Anthonius Martinus Cornelis Petrus De Jong , Kornelis Tijmen Hoekerd
- 申请人： Bauke Jansen , Raymond Gerardus Marius Beeren , Anthonius Martinus Cornelis Petrus De Jong , Kornelis Tijmen Hoekerd
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthdrop Shaw Pittman LLP
- 主分类号： B08B3/10
- IPC分类号： B08B3/10
摘要：
A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
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