公开(公告)号：US20110069290A1

公开(公告)日：2011-03-24

申请号：US12957979

申请日：2010-12-01

申请人： Bauke JANSEN ,  Raymond Gerardus Marius Beeren ,  Anthonius Martinus, Cornelis Petrus De Jong ,  Kornelis Tijmen Hoekerd

发明人： Bauke JANSEN ,  Raymond Gerardus Marius Beeren ,  Anthonius Martinus, Cornelis Petrus De Jong ,  Kornelis Tijmen Hoekerd

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03F7/70341

摘要： A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.

摘要翻译： 公开了一种用于清洁浸没式光刻设备的液体限制系统的表面的清洁工具，液体限制系统具有允许通过其中的浸没式光刻设备的光束通过的孔。 清洁工具包括声音换能器，被配置为在声音换能器和待清洁表面之间保持液体的储存器，以及位于孔下方的储存器中的屏障，以在使用中形成对声波的屏蔽。

公开(公告)号：US20090015805A1

公开(公告)日：2009-01-15

申请号：US12081171

申请日：2008-04-11

申请人： Bauke Jansen ,  Raymond Gerardus Beeren ,  Anthonius Martinus De Jong ,  Kornelis Tijmen Hoekerd

发明人： Bauke Jansen ,  Raymond Gerardus Beeren ,  Anthonius Martinus De Jong ,  Kornelis Tijmen Hoekerd

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03F7/70341

摘要： A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.

摘要翻译： 公开了一种用于清洁浸没式光刻设备的液体限制系统的表面的清洁工具，液体限制系统具有允许通过其中的浸没式光刻设备的光束通过的孔。 清洁工具包括声音换能器，被配置为在声音换能器和待清洁表面之间保持液体的储存器，以及位于孔下方的储存器中的屏障，以在使用中形成对声波的屏蔽。

公开(公告)号：US08011377B2

公开(公告)日：2011-09-06

申请号：US12081170

申请日：2008-04-11

申请人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marlus Beeren ,  Kornelis Tijmen Hoekerd

发明人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marlus Beeren ,  Kornelis Tijmen Hoekerd

IPC分类号： B08B3/04

CPC分类号： B08B3/12 ,  B08B3/08 ,  B08B2203/0288 ,  G03F7/70341 ,  G03F7/70925

摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.

摘要翻译： 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和 被布置为使得在使用中，液体在重力的影响下流入出口。

公开(公告)号：US20080273181A1

公开(公告)日：2008-11-06

申请号：US11819949

申请日：2007-06-29

申请人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren ,  Kornelis Tijmen Hoekerd

发明人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren ,  Kornelis Tijmen Hoekerd

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  B08B3/12 ,  G03F7/70341

摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.

摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。 在液体中诱导流动，期望地是径向流动。

公开(公告)号：US08760616B2

公开(公告)日：2014-06-24

申请号：US12956934

申请日：2010-11-30

申请人： Takeshi Kaneko ,  Kornelis Tijmen Hoekerd

发明人： Takeshi Kaneko ,  Kornelis Tijmen Hoekerd

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975

摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

摘要翻译： 提供了一种用于清洁光刻设备的污染表面的设备和方法。 液体限制结构包括用于向结构下方的间隙供应和提取液体的至少两个开口。 可以切换开口之间的流动方向。 液体可以被供应到适于双流的开口的径向向外的间隙。 供应和提取线分别从液体限制结构提供液体和从液体中提取液体具有耐有机液体腐蚀的内表面。 腐蚀性清洁液可用于清洁光刻胶污染物。

公开(公告)号：US20130077065A1

公开(公告)日：2013-03-28

申请号：US13623790

申请日：2012-09-20

申请人： Raymond Wilhelmus Louis LAFARRE ,  Roelof Frederik De Graaf ,  Niek Jacobus Johannes Roset ,  Arjan Hubrecht Josef Anna Martens ,  Alexander Nikolov Zdravkov ,  Kornelis Tijmen Hoekerd ,  Nina Vladimirovna Dziomkina

发明人： Raymond Wilhelmus Louis LAFARRE ,  Roelof Frederik De Graaf ,  Niek Jacobus Johannes Roset ,  Arjan Hubrecht Josef Anna Martens ,  Alexander Nikolov Zdravkov ,  Kornelis Tijmen Hoekerd ,  Nina Vladimirovna Dziomkina

IPC分类号： G03F7/20 ,  B32B3/02 ,  B08B3/04

CPC分类号： G03F7/2041 ,  B08B1/00 ,  B08B3/04 ,  B08B7/0028 ,  B08B7/0035 ,  B32B3/02 ,  B32B2432/00 ,  G03F7/70341 ,  G03F7/70908 ,  G03F7/70925 ,  Y10T428/24355 ,  Y10T428/24752

摘要： A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example.

摘要翻译： 一种用于清洁盖子以密封位于桌子的凹部中的物体与在桌子的上表面之间的间隙的方法和设备。 公开了在线和离线布置。 可以使用磨损，紫外线辐射或用清洁液冲洗来进行清洁。

公开(公告)号：US20110292359A1

公开(公告)日：2011-12-01

申请号：US13198479

申请日：2011-08-04

申请人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren ,  Kornelis Tijmen Hoekerd

发明人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren ,  Kornelis Tijmen Hoekerd

IPC分类号： G03B27/52 ,  B08B3/12 ,  B08B3/04

CPC分类号： B08B3/12 ,  B08B3/08 ,  B08B2203/0288 ,  G03F7/70341 ,  G03F7/70925

摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.

摘要翻译： 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和 被布置为使得在使用中，液体在重力的影响下流入出口。

公开(公告)号：US20090015804A1

公开(公告)日：2009-01-15

申请号：US12081170

申请日：2008-04-11

申请人： Anthonius Martinus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Cuijpers ,  Raymond Gerardus Beeren ,  Kornelis Tijmen Hoekerd

发明人： Anthonius Martinus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Cuijpers ,  Raymond Gerardus Beeren ,  Kornelis Tijmen Hoekerd

IPC分类号： G03B27/52 ,  B08B13/00 ,  B08B3/12

CPC分类号： B08B3/12 ,  B08B3/08 ,  B08B2203/0288 ,  G03F7/70341 ,  G03F7/70925

摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.

摘要翻译： 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和 被布置为使得在使用中，液体在重力的影响下流入出口。

公开(公告)号：US08947629B2

公开(公告)日：2015-02-03

申请号：US12081169

申请日：2008-04-11

申请人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren ,  Kornelis Tijmen Hoekerd

发明人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Marco Koert Stavenga ,  Peter Franciscus Wanten ,  Bauke Jansen ,  Johannes Wilhelmus Jacobus Leonardus Cuijpers ,  Raymond Gerardus Marius Beeren ,  Kornelis Tijmen Hoekerd

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  G03F7/70341

摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.

公开(公告)号：US07866330B2

公开(公告)日：2011-01-11

申请号：US12081171

申请日：2008-04-11

申请人： Bauke Jansen ,  Raymond Gerardus Marius Beeren ,  Anthonius Martinus Cornelis Petrus De Jong ,  Kornelis Tijmen Hoekerd

发明人： Bauke Jansen ,  Raymond Gerardus Marius Beeren ,  Anthonius Martinus Cornelis Petrus De Jong ,  Kornelis Tijmen Hoekerd

IPC分类号： B08B3/10

CPC分类号： G03F7/70925 ,  G03F7/70341

摘要： A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.

摘要翻译： 公开了一种用于清洁浸没式光刻设备的液体限制系统的表面的清洁工具，液体限制系统具有允许通过其中的浸没式光刻设备的光束通过的孔。 清洁工具包括声音换能器，被配置为在声音换能器和待清洁表面之间保持液体的储存器，以及位于孔下方的储存器中的屏障，以在使用中形成对声波的屏蔽。