发明授权
- 专利标题： Reticle system for manufacturing integrated circuit systems
- 专利标题（中）： 用于制造集成电路系统的标线系统
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申请号： US12122866申请日： 2008-05-19
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公开(公告)号： US07867698B2公开(公告)日： 2011-01-11
- 发明人: Gek Soon Chua , Sia Kim Tan , Byoung-IL Choi , Ryan Chong , Martin Yeo
- 申请人： Gek Soon Chua , Sia Kim Tan , Byoung-IL Choi , Ryan Chong , Martin Yeo
- 申请人地址： SG Singapore
- 专利权人： Chartered Semiconductor Manufacturing Ltd.
- 当前专利权人： Chartered Semiconductor Manufacturing Ltd.
- 当前专利权人地址： SG Singapore
- 代理商 Mikio Ishimaru
- 主分类号： G03C5/00
- IPC分类号： G03C5/00
摘要：
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow.
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